AMD’s liquid phase exfoliation patent granted in US

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Advanced Material Development is proud to announce that its patent for Liquid Phase Exfoliation to produce 2d nanomaterials has been granted in the US. This important milestone has been reached after significant efforts to develop a range of materials for its expanding product portfolio.

The patent covers the production of 2d nanomaterials from bulk materials using a high-pressure homogenisation process in aqueous or organic solvents. The primary application is in producing graphene-based materials, including graphene nanoplatelets and few-layer graphene. A range of highly conductive hybrid inks and coatings is possible through careful formulation with other ingredients.

John Lee, CEO said, "The granting of this patent in the US for AMD is strong validation of the efforts of everyone within the company and our external research partners and will enable us to progress rapidly with the commercialisation of our products. Our energy efficient process allows us to produce materials fit for the marketplace at the right price and with low overall energy consumption. AMD continues to develop and protect IP through a number of patent family filings where it considers it has a strong solution and a clear route to market."

25-April-2023

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